제품 정보
Lab Sputter
제품설명
- Information
- Specs
- Video/Photo
 |
Information |
- Metallizing to build the Electrode
- Mini ion Sputter Coater
- Power Supply : DC or RF Power
- Consist of
• Vacuum chamber with target & Sample stage
• Power Supply (DC or RF Power)
• Vacuum & Gas flowing system
- Gun type : Normal (without Magnet) & Magnetron gun (with Magnet)
- Target Mat'l : Au, Ag, Pt, Cu etc
 |
SPEC |
- Target Electrode Size : Φ50mm
- Target Size : Max Φ50mm
- 제품 Stage Size : Φ50mm
- 제품 Table vs Electrode height : 기존 40mm (gun type 따라 조정)
- Chamber size : ID-Φ105, H-90mm
- Working pressure : 10-1~10-3 Torr
- Dimensions : Φ140/ H195
- Power : 220VAC single phase
* Ion Sputter Coater :
전도성이나 비전도성 시료의 표면에 Plasma를 생성하여 금속박막(Electrode)을 형성시키는 Coater
- Target Electrode Size : Φ50mm
- Target Size : Max Φ50mm
- 제품 Stage Size : Φ50mm
- 제품 Table vs Electrode height : 기존 40mm (gun type 따라 조정)
- Chamber size : ID-Φ105, H-90mm
- Working pressure : 10-1~10-3 Torr
- Dimensions : Φ140/ H195
- Power : 220VAC single phase
* Ion Sputter Coater :
전도성이나 비전도성 시료의 표면에 Plasma를 생성하여 금속박막(Electrode)을 형성시키는 Coater